Etchant composition and methods of fabricating metal wiring and thin film transistor substrate using the same

US9136137B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9136137-B2
Application numberUS-201414263956-A
CountryUS
Kind codeB2
Filing dateApr 28, 2014
Priority dateSep 24, 2013
Publication dateSep 15, 2015
Grant dateSep 15, 2015

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Abstract

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An etchant composition including 0.5 wt % to 20 wt % of a persulfate, 0.01 wt % to 1 wt % of a fluorine compound, 1 wt % to 10 wt % of an inorganic acid, 0.01 wt % to 2 wt % of an azole-based compound, 0.1 wt % to 5 wt % of a chlorine compound, 0.05 wt % to 3 wt % of a copper salt, 0.01 wt % to 5 wt % of an antioxidant or a salt thereof, based on a total weight of the etchant composition, and water in an amount sufficient for the total weight of the etchant composition to be equal to 100 wt % is disclosed. The etchant composition is suitable for use in forming a metal wiring by etching a metal layer including copper or in fabricating a thin film transistor substrate for a display apparatus.

First claim

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What is claimed is: 1. An etchant composition comprising: 0.5 wt % to 20 wt % of a persulfate; 0.01 wt % to 1 wt % of a fluorine compound; 1 wt % to 10 wt % of an inorganic acid; 0.01 wt % to 2 wt % of an azole-based compound; 0.1 wt % to 5 wt % of a chlorine compound; 0.05 wt % to 3 wt % of a copper salt; 0.01 wt % to 5 wt % of an antioxidant or a salt thereof comprising ascorbic acid, glutathione, lipoic acid, uric acid, or a salt thereof, based on a total weight of…

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What does patent US9136137B2 cover?
An etchant composition including 0.5 wt % to 20 wt % of a persulfate, 0.01 wt % to 1 wt % of a fluorine compound, 1 wt % to 10 wt % of an inorganic acid, 0.01 wt % to 2 wt % of an azole-based compound, 0.1 wt % to 5 wt % of a chlorine compound, 0.05 wt % to 3 wt % of a copper salt, 0.01 wt % to 5 wt % of an antioxidant or a salt thereof, based on a total weight of the etchant composition, and w…
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P50/642. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 15 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).