Substrate processing apparatus and control method for a substrate processing apparatus
US-2024120204-A1 · Apr 11, 2024 · US
Methods of and apparatus for controlling pressure in multiple zones of a process tool
US9127361B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9127361-B2 |
| Application number | US-63251409-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 7, 2009 |
| Priority date | Dec 7, 2009 |
| Publication date | Sep 8, 2015 |
| Grant date | Sep 8, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A method of and a multiple zone pressure controller system for controlling the pressure of a gas or vapor flowing to at least two zones of a process tool such as a vacuum deposition chamber. The system comprises: at least two channels configured and arranged so as to provide the flow of the gas or vapor to corresponding zones of the process tool, each channel including a pressure controller configured and arranged to control the pressure of gas or vapor in each channel, a leakby orifice or nozzle configured to provide a leak rate of gas or vapor from the channel; and a controller configured and arrange to determine the true flow information to each zone of the process tool so that the true leak rate in the chamber can be determined.
First claim
Opening claim text (preview).
What is claimed is: 1. A multiple zone pressure controller system for controlling the pressure of a gas or vapor flowing to at least two zones of a process tool, the system comprising: at least two channels configured and arranged to provide the flow of the gas or vapor to corresponding zones of the process tool, each channel including: a flow sensor configured and arranged to sense the flow of gas or vapor in the channel; and a leak-by orifice or nozzle configured to provide…
Assignees
Inventors
Classifications
- C23C16/45557Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
Physics · mapped topic
Chemistry & Metallurgy · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9127361B2 cover?
- A method of and a multiple zone pressure controller system for controlling the pressure of a gas or vapor flowing to at least two zones of a process tool such as a vacuum deposition chamber. The system comprises: at least two channels configured and arranged so as to provide the flow of the gas or vapor to corresponding zones of the process tool, each channel including a pressure controller con…
- Who is the assignee on this patent?
- Ding Junhua, Mks Instr Inc
- What technology area does this patent fall under?
- Primary CPC classification C23C16/45557. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Sep 08 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).