Susceptor support shaft for improved wafer temperature uniformity and process repeatability

Patent metadata

Field	Value
Publication number	US-9123765-B2
Application number	US-201414182634-A
Country	US
Kind code	B2
Filing date	Feb 18, 2014
Priority date	Mar 11, 2013
Publication date	Sep 1, 2015
Grant date	Sep 1, 2015

Abstract

Embodiments of the invention generally relate to susceptor support shafts and process chambers containing the same. A susceptor support shaft supports a susceptor thereon, which in turn, supports a substrate during processing. The susceptor support shaft reduces variations in temperature measurement of the susceptor and/or substrate by providing a consistent path for a pyrometer focal beam directed towards the susceptor and/or substrate, even when the susceptor support shaft is rotated. The susceptor support shafts also have a relatively low thermal mass which increases the ramp up and ramp down rates of a process chamber.

First claim

We claim:

1. A susceptor support shaft for a process chamber, comprising:
a cylindrical support shaft; and
a support body coupled to the cylindrical support shaft, the support body comprising:

a hub;
a plurality of tapered bases extending from the hub;
at least three support arms extending from some of the tapered bases,

wherein each support arm is an angular arm comprising an elbow; and
at least three dummy arms extending from some of the tapered bases,…

Assignees

• Applied Materials Inc

Inventors

• Samir Mehmet Tugrul
• Lau Shu-Kwan

Classifications

• H10P72/7612

  Electricity · mapped topic

• H10P72/7626 Primary

  Electricity · mapped topic

• B05C11/08

  Operations & Transport · mapped topic

• H01L21/68792 Primary

  Electricity · mapped topic