Semiconductor device and manufacturing method of semiconductor device

US9123739B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9123739-B2
Application numberUS-201213548078-A
CountryUS
Kind codeB2
Filing dateJul 12, 2012
Priority dateAug 8, 2011
Publication dateSep 1, 2015
Grant dateSep 1, 2015

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  5. First independent claim

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Abstract

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A semiconductor device includes: a first nitride semiconductor layer; a second nitride semiconductor layer formed over the first nitride semiconductor layer; and a gate electrode facing the second nitride semiconductor layer via a gate insulating film. Because the second nitride semiconductor layer is formed by stacking plural semiconductor layers with their Al composition ratios different from each other, the Al composition ratio of the second nitride semiconductor layer changes stepwise. The semiconductor layers forming the second nitride semiconductor layer are polarized in the same direction so that, among the semiconductor layers, a semiconductor layer nearer to the gate electrode has higher (or lower) intensity of polarization. In other words, the intensities of polarization of the semiconductor layers change with an inclination based on their distances from the gate electrode so that, at each interface between two semiconductor layers, the amount of negative charge becomes larger than that of positive charge.

First claim

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What is claimed is: 1. A semiconductor device, comprising: a first nitride semiconductor layer; a second nitride semiconductor layer formed over the first nitride semiconductor layer; a gate insulating film contacting the second nitride semiconductor layer; and a gate electrode facing the second nitride semiconductor layer via the gate insulating film, wherein the second nitride semiconductor layer is formed by stacking a plurality of semiconductor layers, and the semicond…

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What does patent US9123739B2 cover?
A semiconductor device includes: a first nitride semiconductor layer; a second nitride semiconductor layer formed over the first nitride semiconductor layer; and a gate electrode facing the second nitride semiconductor layer via a gate insulating film. Because the second nitride semiconductor layer is formed by stacking plural semiconductor layers with their Al composition ratios different from…
Who is the assignee on this patent?
Okamoto Yasuhiro, Nakayama Tatsuo, Inoue Takashi, and 2 more
What technology area does this patent fall under?
Primary CPC classification H10D64/513. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Sep 01 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).