Microlithographic projection exposure apparatus illumination optics
US-9223226-B2 · Dec 29, 2015 · US
Illumination system and lithographic apparatus
US9116439B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9116439-B2 |
| Application number | US-201113051384-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 18, 2011 |
| Priority date | Mar 22, 2010 |
| Publication date | Aug 25, 2015 |
| Grant date | Aug 25, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
First claim
Opening claim text (preview).
The invention claimed is: 1. An illumination system, comprising: a polarization member comprising first and second polarization modifiers each connected to an actuator configured to move the first polarization modifier relative to the second polarization modifier and to move the first and second polarization modifiers into at least partial intersection with a radiation beam at respectively different locations along the path of the radiation beam such that the first and second pola…
Assignees
Inventors
Classifications
- G03F7/70566Primary
Physics · mapped topic
- G03F7/70116Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9116439B2 cover?
- An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements posit…
- Who is the assignee on this patent?
- Mulder Heine Melle, Hansen Steven George, Mulkens Johannes Catharinus Hubertus, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70566. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 25 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).