Systems and methods for monitoring and controlling industrial processes
US-2024361756-A1 · Oct 31, 2024 · US
Customized manufacturing method for an optoelectrical device
US9110463B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9110463-B2 |
| Application number | US-201213453544-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 23, 2012 |
| Priority date | Feb 26, 2008 |
| Publication date | Aug 18, 2015 |
| Grant date | Aug 18, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
The disclosure provides a customized manufacturing method for an optoelectrical device. The customized manufacturing method comprises the steps of providing a manufacturing flow including a front-end flow, a customized module subsequent to the front-end flow, and a pause step between the front-end flow and the customized module, processing a predetermined amount of semi-manufactured products queued at the pause step, tuning the customized module in accordance with a customer's request, and processing the semi-manufactured products by the tuned customized module to fulfill the customer's request.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing an optoelectronic device comprising the steps of: providing a growth wafer; growing an epitaxial stack having optoelectrical properties on the growth wafer to form a semi-manufactured product; detecting the optoelectrical criteria of the semi-manufactured product; providing a pause step after the detecting step, wherein the semi-manufactured product is queued at the pause step for a predetermined time period; providing a pr…
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- G05B19/41865Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Cross-Sectional Technologies · mapped topic
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Frequently asked questions
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- What does patent US9110463B2 cover?
- The disclosure provides a customized manufacturing method for an optoelectrical device. The customized manufacturing method comprises the steps of providing a manufacturing flow including a front-end flow, a customized module subsequent to the front-end flow, and a pause step between the front-end flow and the customized module, processing a predetermined amount of semi-manufactured products qu…
- Who is the assignee on this patent?
- Hsieh Min-Hsun, Epistar Corp
- What technology area does this patent fall under?
- Primary CPC classification G05B19/41865. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 18 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).