Components of an electronic device and methods for their assembly
US-2024431057-A1 · Dec 26, 2024 · US
Manufacturing method of mask plate and array substrate
US9110375B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9110375-B2 |
| Application number | US-201313985286-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 1, 2013 |
| Priority date | Jun 20, 2013 |
| Publication date | Aug 18, 2015 |
| Grant date | Aug 18, 2015 |
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Abstract
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A manufacturing method of a mask plate and an array substrate is provided. The mask plate is for manufacturing fanout leads in a non-effective display area on an array substrate. The mask plate includes a fanout lead pattern having a plurality of fanout impression lines, wherein each fanout impression line has a predetermined line width, and each of some of the fanout impression lines has at least one curve portion, wherein for one fanout impression line, a line width of the at least one curve portion is smaller than the predetermined line width of the fanout impression line. A manufacturing method of an array substrate utilizes the foregoing mask plate to manufacture the array substrate.
First claim
Opening claim text (preview).
What is claimed is: 1. A mask plate for manufacturing fanout leads in a non-effective display area on an array substrate, comprising: a fanout lead pattern having a plurality of fanout impression lines, wherein an effective length of each fanout impression line is equal, and each fanout impression line has a predetermined line width, and some of the fanout impression lines have at least one curve portion, wherein for one fanout impression line having two or more curve portions, th…
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- What does patent US9110375B2 cover?
- A manufacturing method of a mask plate and an array substrate is provided. The mask plate is for manufacturing fanout leads in a non-effective display area on an array substrate. The mask plate includes a fanout lead pattern having a plurality of fanout impression lines, wherein each fanout impression line has a predetermined line width, and each of some of the fanout impression lines has at le…
- Who is the assignee on this patent?
- Shenzhen China Star Optoelect
- What technology area does this patent fall under?
- Primary CPC classification G03F1/38. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 18 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).