Quantum dot color filter ink compositions and devices utilizing the same
US-2024192548-A1 · Jun 13, 2024 · US
Color filter and manufacturing method for the same
US9110328B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9110328-B2 |
| Application number | US-201213641131-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 23, 2012 |
| Priority date | May 11, 2012 |
| Publication date | Aug 18, 2015 |
| Grant date | Aug 18, 2015 |
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Abstract
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The present invention provides a color filter and a manufacturing method thereof. A transparent dyeable material is coated on a roller, and then imprint onto a patterned mold. A part of the transparent dyeable material is retained on the roller, and then imprinted onto a substrate by the roller and forms a black matrix (BM) layer through a dyeing process and a curing process in sequence. The other part of the transparent dyeable material is transferred onto the patterned mold for forming a plurality of softened color resist layers by the dyeing process, and then forms a plurality of color resist layers by a curing process after transferring the softened color resist layers onto the substrate having the BM layer.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing a color filter, the method comprising steps of: providing a roller, and coating a transparent dyeable material onto the roller; providing a patterned mold, a surface of the patterned mold including a first pattern and a second pattern; and then rolling the roller along the surface of the patterned mold, the transparent dyeable material corresponding to the first pattern being adhered on the patterned mold, and the transparent dye…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- G02F1/133516Primary
Physics · mapped topic
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Frequently asked questions
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- What does patent US9110328B2 cover?
- The present invention provides a color filter and a manufacturing method thereof. A transparent dyeable material is coated on a roller, and then imprint onto a patterned mold. A part of the transparent dyeable material is retained on the roller, and then imprinted onto a substrate by the roller and forms a black matrix (BM) layer through a dyeing process and a curing process in sequence. The ot…
- Who is the assignee on this patent?
- Chen Hsiao-Hsien, Shenzhen China Star Optoelect
- What technology area does this patent fall under?
- Primary CPC classification G02F1/133516. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 18 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).