Hard laminar coating

US9109280B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9109280-B2
Application numberUS-201113982860-A
CountryUS
Kind codeB2
Filing dateFeb 1, 2011
Priority dateFeb 1, 2011
Publication dateAug 18, 2015
Grant dateAug 18, 2015

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A hard laminar coating having a first 61 m and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein the first film is a carbide, a nitride, a carboxide, a nitroxide, a carbonitride or a carbo-oxynitride of (Al a Cr b B c ), while the second film is TiB 2 , the hard laminar coating configured to include atomic ratios a, b and c in the first film satisfying a=1−b−c, 0.2≦b≦0.7, and 0<c≦0.2, and a thickness of the first film being no less than 0.1 μm and no more than 5.0 μm, while a thickness of the second film being no less than 0.1 μm and no more than 5.0 μm, and to have a total thickness of no less than 0.2 μm and no more than 10.0 μm, and the hard laminar.

First claim

Opening claim text (preview).

The invention claimed is: 1. A hard laminar coating consisting of a plurality of films including two kinds of films in the form of a first film and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein said first film is a carbide, a nitride, a carboxide, a nitroxide, a carbonitride or a carbo-oxynitride of (Al a Cr b B C ), while said second film is TiB 2 , said hard laminar coating configured to include atomic…

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What does patent US9109280B2 cover?
A hard laminar coating having a first 61 m and a second film having respective different compositions and alternately laminated on a surface of a base structure, wherein the first film is a carbide, a nitride, a carboxide, a nitroxide, a carbonitride or a carbo-oxynitride of (Al a Cr b B c ), while the second film is TiB 2 , the hard laminar coating configured to include atomic ratios a, b and …
Who is the assignee on this patent?
Sakurai Masatoshi, OHCHI Toshihiro, Osg Corp
What technology area does this patent fall under?
Primary CPC classification C23C14/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 18 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).