Processes for making catalyst compositions having improved flow
US-2015353651-A1 · Dec 10, 2015 · US
Method for producing polymer, polymer for lithography, resist composition, and method for producing substrate
US9109060B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9109060-B2 |
| Application number | US-201013382397-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 7, 2010 |
| Priority date | Jul 7, 2009 |
| Publication date | Aug 18, 2015 |
| Grant date | Aug 18, 2015 |
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Abstract
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A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.
First claim
Opening claim text (preview).
The invention claimed is: 1. A polymerization method, the method comprising: (I) feeding a first solution to a reactor, wherein the feeding (I) occurs before or simultaneously with the start of a dropwise addition of a polymerization initiator to the reactor, and the first solution comprises two or more monomers α 1 to α n in a first composition ratio; (II) feeding a second solution to the reactor, wherein the feeding (II) occurs after or simultaneously with the start of the f…
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- C08F2/00Primary
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9109060B2 cover?
- A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution cont…
- Who is the assignee on this patent?
- Yasuda Atsushi, Oshikiri Tomoya, Matsumoto Daisuke, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification C08F2/00. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 18 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).