Platinum adlayered ruthenium nanoparticles, method for preparing, and uses thereof

US9105934B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9105934-B2
Application numberUS-201113081809-A
CountryUS
Kind codeB2
Filing dateApr 7, 2011
Priority dateApr 8, 2010
Publication dateAug 11, 2015
Grant dateAug 11, 2015

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Abstract

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A superior, industrially scalable one-pot ethylene glycol-based wet chemistry method to prepare platinum-adlayered ruthenium nanoparticles has been developed that offers an exquisite control of the platinum packing density of the adlayers and effectively prevents sintering of the nanoparticles during the deposition process. The wet chemistry based method for the controlled deposition of submonolayer platinum is advantageous in terms of processing and maximizing the use of platinum and can, in principle, be scaled up straightforwardly to an industrial level. The reactivity of the Pt(31)-Ru sample was about 150% higher than that of the industrial benchmark PtRu (1:1) alloy sample but with 3.5 times less platinum loading. Using the Pt(31)-Ru nanoparticles would lower the electrode material cost compared to using the industrial benchmark alloy nanoparticles for direct methanol fuel cell applications.

First claim

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What is claimed is: 1. A process for depositing a platinum (Pt) adlayer on a ruthenium (Ru) nanoparticle which comprises a polyol reduction. 2. The process according to claim 1 , wherein the polyol reduction is an ethylene glycol reduction. 3. The process according to claim 2 , wherein the ethylene glycol reduction comprises: a. cleaning the surface of the ruthenium nanoparticles so that the surface is free of ruthenium oxide by reducing t…

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What does patent US9105934B2 cover?
A superior, industrially scalable one-pot ethylene glycol-based wet chemistry method to prepare platinum-adlayered ruthenium nanoparticles has been developed that offers an exquisite control of the platinum packing density of the adlayers and effectively prevents sintering of the nanoparticles during the deposition process. The wet chemistry based method for the controlled deposition of submono…
Who is the assignee on this patent?
Tong Yuye, Du Bingchen, Univ Georgetown
What technology area does this patent fall under?
Primary CPC classification H01M4/8657. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).