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Microelectronic structure including air gap
US9105693B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9105693-B2 |
| Application number | US-201213614563-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 13, 2012 |
| Priority date | Apr 29, 2010 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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Abstract
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A microelectronic structure and a method for fabricating the microelectronic structure provide a plurality of voids interposed between a plurality of conductor layers. The plurality of voids is also located between a liner layer and an inter-level dielectric layer. The voids provide for enhanced electrical performance of the microelectronic structure.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for fabricating a microelectronic structure comprising; forming a first dielectric layer over a substrate; forming a plurality of conductor layers embedded and planarized within the first dielectric layer and including a plurality of apertures interposed between the plurality of conductor layers, wherein a barrier layer is located upon a bottom and sidewall of each conductor layer; forming a plurality of capping layers aligned upon top surfaces…
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Electricity · mapped topic
- H10W20/075Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9105693B2 cover?
- A microelectronic structure and a method for fabricating the microelectronic structure provide a plurality of voids interposed between a plurality of conductor layers. The plurality of voids is also located between a liner layer and an inter-level dielectric layer. The voids provide for enhanced electrical performance of the microelectronic structure.
- Who is the assignee on this patent?
- Edelstein Daniel C, Horak David V, Huang Elbert E, and 5 more
- What technology area does this patent fall under?
- Primary CPC classification H10W20/075. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).