Methods for forming recesses in source/drain regions and devices formed thereof
US-12132089-B2 · Oct 29, 2024 · US
US9105583B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9105583-B2 |
| Application number | US-201313735314-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 7, 2013 |
| Priority date | Jan 7, 2013 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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A material can be locally etched with arbitrary changes in the direction of the etch. A ferromagnetic-material-including catalytic particle is employed to etch the material. A wet etch chemical or a plasma condition can be employed in conjunction with the ferromagnetic-material-including catalytic particle to etch a material through a catalytic reaction between the catalytic particle and the material. During a catalytic etch process, a magnetic field is applied to the ferromagnetic-material-including catalytic particle to direct the movement of the particle to any direction, which is chosen so as to form a contiguous cavity having at least two cavity portions having different directions. The direction of the magnetic field can be controlled so as to form the contiguous cavity in a preplanned pattern, and each segment of the contiguous cavity can extend along an arbitrary direction.
Opening claim text (preview).
What is claimed is: 1. A method of etching a material, said method comprising: disposing at least one ferromagnetic-material-including catalytic particle on a material; performing a catalytic etch process on said material by activating said at least one ferromagnetic-material-including catalytic particle with a chemical or a plasma; and changing a direction of propagation of said at least one ferromagnetic-material-including catalytic particle during said catalytic etch proces…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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