Catalytic etch with magnetic direction control

US9105583B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9105583-B2
Application numberUS-201313735314-A
CountryUS
Kind codeB2
Filing dateJan 7, 2013
Priority dateJan 7, 2013
Publication dateAug 11, 2015
Grant dateAug 11, 2015

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  5. First independent claim

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Abstract

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A material can be locally etched with arbitrary changes in the direction of the etch. A ferromagnetic-material-including catalytic particle is employed to etch the material. A wet etch chemical or a plasma condition can be employed in conjunction with the ferromagnetic-material-including catalytic particle to etch a material through a catalytic reaction between the catalytic particle and the material. During a catalytic etch process, a magnetic field is applied to the ferromagnetic-material-including catalytic particle to direct the movement of the particle to any direction, which is chosen so as to form a contiguous cavity having at least two cavity portions having different directions. The direction of the magnetic field can be controlled so as to form the contiguous cavity in a preplanned pattern, and each segment of the contiguous cavity can extend along an arbitrary direction.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of etching a material, said method comprising: disposing at least one ferromagnetic-material-including catalytic particle on a material; performing a catalytic etch process on said material by activating said at least one ferromagnetic-material-including catalytic particle with a chemical or a plasma; and changing a direction of propagation of said at least one ferromagnetic-material-including catalytic particle during said catalytic etch proces…

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What does patent US9105583B2 cover?
A material can be locally etched with arbitrary changes in the direction of the etch. A ferromagnetic-material-including catalytic particle is employed to etch the material. A wet etch chemical or a plasma condition can be employed in conjunction with the ferromagnetic-material-including catalytic particle to etch a material through a catalytic reaction between the catalytic particle and the ma…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification H10P50/642. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).