Semiconductor devices and methods for manufacturing the same
US-2015325703-A1 · Nov 12, 2015 · US
US9105482B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9105482-B2 |
| Application number | US-201213556300-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 24, 2012 |
| Priority date | Jan 8, 2010 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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Official abstract text for this publication.
A nanowire tunnel device includes a nanowire suspended above a semiconductor substrate by a first pad region and a second pad region, the nanowire having a channel portion surrounded by a gate structure disposed circumferentially around the nanowire, an n-type doped region including a first portion of the nanowire adjacent to the channel portion, and a p-type doped region including a second portion of the nanowire adjacent to the channel portion.
Opening claim text (preview).
What is claimed is: 1. A nanowire tunnel device, comprising: a nanowire spaced apart and above a semiconductor substrate by a first pad region and a second pad region, the nanowire having a channel portion surrounded by a gate structure disposed circumferentially around the nanowire, the gate structure comprising a metal layer and a conductive polysilicon capping layer disposed directly onto and encapsulating the metal layer; a first protective spacer adjacent to a sidewall of t…
Electricity · mapped topic
Electricity · mapped topic
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