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System and a method for nano imprinting
US9104948B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9104948-B2 |
| Application number | US-201414188722-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 25, 2014 |
| Priority date | Sep 16, 2008 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A method for creating a highly accurate nanostructure is provided, the method includes: (i) creating a highly accurate nanostructure prototype, wherein the highly accurate nanostructure prototype, when illuminated with a predefined illumination, provides a unique optical pattern; (ii) creating at least one highly accurate nanostructure mold from the highly accurate nanostructure prototype, wherein each highly accurate nanostructure mold enables a creation of a highly accurate nanostructure that is substantially similar to the highly accurate nano structure prototype and which, when illuminated with the predefined illumination, provides the unique optical pattern; and (iii) molding the highly accurate nano structure using the highly accurate nano structure mold, wherein the highly accurate nanostructure, when illuminated with the predefined illumination, provides the unique optical pattern.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of molding, comprising, creating a plurality of nanostructure mold replicas from a single nanostructure prototype, wherein said nanostructure prototype provides a unique optical pattern when illuminated with a predefined illumination, and wherein each nanostructure mold replica enables a creation of a nanostructure that is substantially similar to said nanostructure prototype and which, when illuminated with the predefined illumination, provides the…
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Classifications
- G06K19/06009Primary
Physics · mapped topic
Cross-Sectional Technologies · mapped topic
- G03F7/0002Primary
Physics · mapped topic
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Frequently asked questions
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- What does patent US9104948B2 cover?
- A method for creating a highly accurate nanostructure is provided, the method includes: (i) creating a highly accurate nanostructure prototype, wherein the highly accurate nanostructure prototype, when illuminated with a predefined illumination, provides a unique optical pattern; (ii) creating at least one highly accurate nanostructure mold from the highly accurate nanostructure prototype, wher…
- Who is the assignee on this patent?
- Univ Ramot
- What technology area does this patent fall under?
- Primary CPC classification G06K19/06009. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).