Manufacturing method for photomask, and photomask
US-2024427229-A1 · Dec 26, 2024 · US
Mask set for double exposure process and method of using the mask set
US9104833B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9104833-B2 |
| Application number | US-201414287079-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 26, 2014 |
| Priority date | Apr 24, 2012 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.
First claim
Opening claim text (preview).
What is claimed is: 1. A mask set for double exposure process, comprising: a first mask having a first mask pattern, said first mask pattern is provided with a first base, a plurality of first teeth, and a plurality of protruding portions, wherein said first teeth and said protruding portions extend from said first base and alternately align along a first direction; and a second mask having a second mask pattern, said second mask pattern is provided with a second base and a plur…
Assignees
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Classifications
Physics · mapped topic
Physics · mapped topic
- G03F1/70Primary
Physics · mapped topic
- G06F30/398Primary
Physics · mapped topic
Physics · mapped topic
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- What does patent US9104833B2 cover?
- A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at l…
- Who is the assignee on this patent?
- United Microelectronics Corp
- What technology area does this patent fall under?
- Primary CPC classification G03F1/70. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).