Optical scanning device and image forming apparatus including the same
US-2015370065-A1 · Dec 24, 2015 · US
Optical projection system
US9104016B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9104016-B2 |
| Application number | US-201213626810-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 25, 2012 |
| Priority date | Oct 8, 2004 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
An optical projection system for a microlithography system includes a light path, a first lens unit receiving a first part of the light path, a second lens unit receiving a second part of the light path, and a support unit supporting the first and second lens units. The first and second lens units are elongated lens units including a plurality of lenses. The support unit includes a housing receiving a third part of the light path and enclosing a reflective element. The housing includes first and second interfaces. The first interface is a first support interface supporting the first lens unit. The second interface is a second support interface supporting the second lens unit at a location substantially opposite to the first interface.
First claim
Opening claim text (preview).
What is claimed is: 1. An optical projection system for a microlithography system comprising a light path, a first lens unit receiving a first part of said light path, a second lens unit receiving a second part of said light path, a support unit supporting said first lens unit and said second lens unit; said first lens unit and said second lens unit being elongated lens units comprising a plurality of lenses; said support unit comprising a housing receiving a third part…
Assignees
Inventors
Classifications
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9104016B2 cover?
- An optical projection system for a microlithography system includes a light path, a first lens unit receiving a first part of the light path, a second lens unit receiving a second part of the light path, and a support unit supporting the first and second lens units. The first and second lens units are elongated lens units including a plurality of lenses. The support unit includes a housing rece…
- Who is the assignee on this patent?
- Zeiss Carl Smt Gmbh
- What technology area does this patent fall under?
- Primary CPC classification G02B7/00. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).