Method and device for controlled laminar flow patterning within a channel

US9103502B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9103502-B2
Application numberUS-201213450759-A
CountryUS
Kind codeB2
Filing dateApr 19, 2012
Priority dateApr 19, 2012
Publication dateAug 11, 2015
Grant dateAug 11, 2015

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Abstract

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A device and method of laminar flow patterning of at least one sample fluid in a main channel in a microfluidic device are provided. A first input channel is provided in the microfluidic device. The first input channel has an output end communicating with the first end of the main channel and an input end communicating with a first input port. A buffer fluid is deposited in the main channel and the first input channel and a first sample fluid is deposited in the first input port. A first pressure is generated in response to the depositing of the first sample fluid in the first input port so as to cause laminar flow of the first sample fluid in the main channel.

First claim

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We claim: 1. A device for controlled laminar flow patterning of at least one sample fluid, comprising: a body defining a channel network, the channel network including: a main channel extending along a longitudinal axis and having a first end and a second end defining an output port; a first input port, the first input port adapted for receiving a first sample fluid of the of at least one sample fluid and for introducing the first sample fluid into the channel network; a firs…

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What does patent US9103502B2 cover?
A device and method of laminar flow patterning of at least one sample fluid in a main channel in a microfluidic device are provided. A first input channel is provided in the microfluidic device. The first input channel has an output end communicating with the first end of the main channel and an input end communicating with a first input port. A buffer fluid is deposited in the main channel and…
Who is the assignee on this patent?
Beebe David J, Warrick Jay, Barthler Erwin, and 1 more
What technology area does this patent fall under?
Primary CPC classification F17D3/00. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).