Superalloy target
US-11866805-B2 · Jan 9, 2024 · US
Nonmagnetic material particle-dispersed ferromagnetic material sputtering target
US9103023B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9103023-B2 |
| Application number | US-201013131124-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 8, 2010 |
| Priority date | Mar 27, 2009 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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Abstract
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A nonmagnetic material particle-dispersed ferromagnetic material sputtering target comprising a mixture of an alloy containing 5 mol % or more and 20 mol % or less of Cr, 5 mol % or more and 30 mol % or less of Pt, and Co as the remainder thereof, and nonmagnetic material particles, wherein the structure of the target includes a phase (A) in which the nonmagnetic material particles are uniformly micro-dispersed in the alloy, and a spherical alloy phase (B) dispersed in the phase (A) in which the ratio of its volume in the target is 4% or more and 40% or less. Obtained is a nonmagnetic material particle-dispersed ferromagnetic material sputtering target capable of improving the leakage magnetic flux to obtain a stable electrical discharge with a magnetron sputtering device, and which has high density and generates few particles during sputtering.
First claim
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The invention claimed is: 1. A ferromagnetic material sputtering target, comprising a sintered compact consisting of Cr of 5 mol % or more and 20 mol % or less, Co, and particles of nonmagnetic material, wherein the sintered compact has a structure having an alloy phase (A) as a matrix in which the particles of the nonmagnetic material and an alloy phase (B) in the form of spherical or spheroidal three dimensional shaped particles of a Co—Cr alloy not containing the particles of th…
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Operations & Transport · mapped topic
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US9103023B2 cover?
- A nonmagnetic material particle-dispersed ferromagnetic material sputtering target comprising a mixture of an alloy containing 5 mol % or more and 20 mol % or less of Cr, 5 mol % or more and 30 mol % or less of Pt, and Co as the remainder thereof, and nonmagnetic material particles, wherein the structure of the target includes a phase (A) in which the nonmagnetic material particles are uniforml…
- Who is the assignee on this patent?
- Sato Atsushi, Jx Nippon Mining & Metals Corp
- What technology area does this patent fall under?
- Primary CPC classification C23C14/3414. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).