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Device material for hole injection transport layer, ink for forming hole injection transport layer, device comprising hole injection transport layer, and method for producing the device
US9102872B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9102872-B2 |
| Application number | US-201013387227-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 29, 2010 |
| Priority date | Jul 31, 2009 |
| Publication date | Aug 11, 2015 |
| Grant date | Aug 11, 2015 |
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Abstract
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Disclosed is a device material for a hole injection transport layer. A fluorine-containing organic compound is attached to the surface of a transition metal-containing nanoparticle or nanocluster which contains at least a transition metal oxide. Also disclosed are a device and an ink for a hole injection transport layer, the device and ink including the device material each, and a method for producing the device.
First claim
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The invention claimed is: 1. A device material for a hole injection transport layer, comprising: a transition metal-containing nanoparticle or nanocluster which contains a transition metal oxide and a fluorine-containing organic compound attached to the surface of the transition metal-containing nanoparticle or nanocluster by a protective agent in which a linking group which functions to link to the transition metal oxide is contained at the terminal end of a fluorine-containing…
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Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
- C09K11/671Primary
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
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- What does patent US9102872B2 cover?
- Disclosed is a device material for a hole injection transport layer. A fluorine-containing organic compound is attached to the surface of a transition metal-containing nanoparticle or nanocluster which contains at least a transition metal oxide. Also disclosed are a device and an ink for a hole injection transport layer, the device and ink including the device material each, and a method for pr…
- Who is the assignee on this patent?
- Ueno Shigehiro, Okada Masato, Taguchi Yosuke, and 4 more
- What technology area does this patent fall under?
- Primary CPC classification C09K11/671. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).