Method of fabricating silicon carbide

US9102543B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9102543-B2
Application numberUS-201214236813-A
CountryUS
Kind codeB2
Filing dateAug 1, 2012
Priority dateAug 1, 2011
Publication dateAug 11, 2015
Grant dateAug 11, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of fabricating silicon carbide according to the embodiment comprises the steps of preparing a mixture by mixing a dry silicon source with a carbon source comprising an organic carbon compound; and reacting the mixture, wherein a viscosity of the carbon source is in a range of 20 cps to 1000 cps.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of fabricating silicon carbide, the method comprising: preparing a mixture by mixing a dry silicon source with a carbon source comprising an organic liquid-phase carbon compound; and reacting the mixture, wherein the preparing of the mixture is achieved by spray-coating the carbon source on the dry silicon source, wherein the mixture is obtained without using a solvent, wherein a viscosity of the carbon source is in a range of about 20…

Assignees

Inventors

Classifications

  • Chemistry & Metallurgy · mapped topic

  • C01B32/97Primary

    Chemistry & Metallurgy · mapped topic

  • C01B31/36Primary

    Chemistry & Metallurgy · mapped topic

  • C01B32/956Primary

    Chemistry & Metallurgy · mapped topic

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What does patent US9102543B2 cover?
A method of fabricating silicon carbide according to the embodiment comprises the steps of preparing a mixture by mixing a dry silicon source with a carbon source comprising an organic carbon compound; and reacting the mixture, wherein a viscosity of the carbon source is in a range of 20 cps to 1000 cps.
Who is the assignee on this patent?
Han Jung Eun, Kim Byung Sook, Lg Innotek Co Ltd
What technology area does this patent fall under?
Primary CPC classification C01B32/97. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).