Carbon material covered with diamond thin film and method of manufacturing same

US9102541B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9102541-B2
Application numberUS-201013260065-A
CountryUS
Kind codeB2
Filing dateMar 19, 2010
Priority dateMar 23, 2009
Publication dateAug 11, 2015
Grant dateAug 11, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A carbon material and a method of manufacturing the carbon material are provided. By affixing diamond particles onto a carbonaceous substrate in a condition in which etching caused by hydrogen radicals is unlikely to occur, the substrate etching rate can be suppressed, and the carbon material is allowed to have a diamond thin film having excellent adhesion capability. The carbon material has a carbonaceous substrate showing a weight decrease under a diamond synthesis condition, diamond particles disposed on a surface of the carbonaceous substrate, and a diamond layer having the diamond particles as seeds. The weight of the diamond particles per unit area is set to from 1.0×10 −4 g/cm 2 to less than 3.0×10 −3 g/cm 2 .

First claim

Opening claim text (preview).

The invention claimed is: 1. A carbon material consisting essentially of: a carbonaceous substrate, diamond particles disposed on a surface of the carbonaceous substrate, and a diamond layer consisting essentially of the diamond particles as seeds, at least one electrical conductivity-imparting element, and a diamond thin film characterized in that: the weight of the diamond particles per unit area is from 1.0×10 −4 g/cm 2 to less than 3.0×10 −3 g/cm 2 , wherein the at…

Assignees

Inventors

Classifications

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • Chemistry & Metallurgy · mapped topic

  • C01B32/25Primary

    Chemistry & Metallurgy · mapped topic

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What does patent US9102541B2 cover?
A carbon material and a method of manufacturing the carbon material are provided. By affixing diamond particles onto a carbonaceous substrate in a condition in which etching caused by hydrogen radicals is unlikely to occur, the substrate etching rate can be suppressed, and the carbon material is allowed to have a diamond thin film having excellent adhesion capability. The carbon material has a …
Who is the assignee on this patent?
Kawano Takanori, Tao Rie, Toyo Tanso Co
What technology area does this patent fall under?
Primary CPC classification C01B32/25. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).