Thin film electrode ceramic substrate and method for manufacturing the same

US9101064B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9101064-B2
Application numberUS-201213548575-A
CountryUS
Kind codeB2
Filing dateJul 13, 2012
Priority dateAug 5, 2011
Publication dateAug 4, 2015
Grant dateAug 4, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

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Disclosed herein are a thin film electrode ceramic substrate and a method for manufacturing the same. The thin film electrode ceramic substrate includes: a ceramic substrate; one or more anti-etching metal layers formed in a surface of the ceramic substrate; thin film electrode pattern formed on the anti-etching metal layers; and a plating layer formed on the thin film electrode pattern, wherein respective edge portions of the thin film electrode pattern are contacted with the anti-etching metal layer, and thus, an undercut defect occurring between the surface of the ceramic substrate and the thin film electrode pattern and between the thin film electrode patterns due to an etchant can be prevented and the binding strength of the entire thin film electrode pattern can be enhanced, resulting in securing durability and reliability of the thin film electrode patterns.

First claim

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What is claimed is: 1. A thin film electrode ceramic substrate, comprising: a ceramic substrate; a plurality of anti-etching metal layers formed in a surface of the ceramic substrate; a thin film electrode pattern formed on the anti-etching metal layers; and a plating layer formed on the thin film electrode pattern, wherein the anti-etching metal layers are extant under respective edge portions of the thin film electrode pattern and extends, in the ceramic substrate, a dis…

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What does patent US9101064B2 cover?
Disclosed herein are a thin film electrode ceramic substrate and a method for manufacturing the same. The thin film electrode ceramic substrate includes: a ceramic substrate; one or more anti-etching metal layers formed in a surface of the ceramic substrate; thin film electrode pattern formed on the anti-etching metal layers; and a plating layer formed on the thin film electrode pattern, wherei…
Who is the assignee on this patent?
Yoo Won Hee, Chang Byeung Gyu, Lee Taek Jung, and 2 more
What technology area does this patent fall under?
Primary CPC classification H05K3/06. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 04 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).