Integrated circuit with ion sensitive sensor and manufacturing method

US9099486B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9099486-B2
Application numberUS-201313920874-A
CountryUS
Kind codeB2
Filing dateJun 18, 2013
Priority dateJun 19, 2012
Publication dateAug 4, 2015
Grant dateAug 4, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Disclosed is an integrated circuit comprising a substrate ( 10 ) carrying plurality of circuit elements ( 20 ); a metallization stack ( 30 ) over said substrate for providing interconnections to at least some of said circuit elements, the metallization stack comprising a plurality of patterned metal layers ( 31 ) spatially separated from each other by respective electrically insulating layers ( 32 ), at least some of said electrically insulating layers comprising conductive portions ( 33 ) that electrically interconnect portions of adjacent metal layers, wherein at least one of the patterned metallization layers comprises a plurality of ion-sensitive electrodes ( 34 ), each ion-sensitive electrode being electrically connected to at least one of said circuit elements, a plurality of sample volumes ( 50 ) extending into said metallization stack, each sample volume terminating at one of said ion-sensitive electrodes; and an ion-sensitive layer lining at least the ion-sensitive electrodes in said sample volumes. A method of manufacturing such an IC is also disclosed.

First claim

Opening claim text (preview).

The invention claimed: 1. An integrated circuit comprising: a substrate carrying plurality of circuit elements; a metallization stack over said substrate for providing interconnections to at least some of said circuit elements, the metallization stack comprising a plurality of patterned metal layers spatially separated from each other by respective electrically insulating layers, at least some of said electrically insulating layers comprising conductive portions that electricall…

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Frequently asked questions

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What does patent US9099486B2 cover?
Disclosed is an integrated circuit comprising a substrate ( 10 ) carrying plurality of circuit elements ( 20 ); a metallization stack ( 30 ) over said substrate for providing interconnections to at least some of said circuit elements, the metallization stack comprising a plurality of patterned metal layers ( 31 ) spatially separated from each other by respective electrically insulating layers (…
Who is the assignee on this patent?
Nxp Bv, Nxp Bv
What technology area does this patent fall under?
Primary CPC classification G01N27/4145. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Aug 04 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).