Laser annealing method and device
US-2015348781-A1 · Dec 3, 2015 · US
US9099362B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9099362-B2 |
| Application number | US-201213544513-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 9, 2012 |
| Priority date | Nov 9, 2000 |
| Publication date | Aug 4, 2015 |
| Grant date | Aug 4, 2015 |
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In a conventional analog buffer circuit composed of polycrystalline semiconductor TFTs, a variation in the output is large. Thus, a measure such as to provide a correction circuit has been taken. However, there has been such a problem that a circuit and driver operation are complicated. Therefore, a gate length and a gate width of a TFT composing an analog buffer circuit is set to be larger. Also, a multi-gate structure is adopted thereto. In addition, the arrangement of channel regions is devised. Thus, the analog buffer circuit having a small variation is obtained without using a correction circuit, and a semiconductor device having a small variation can be provided.
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What is claimed is: 1. A semiconductor device comprising: a driver circuit comprising: a first channel region; a second channel region; a third channel region adjacent to the first and the second channel region; a fourth channel region adjacent to the first and the second channel region; a fifth channel region; a first gate electrode overlapping with the first channel region and the second channel region, wherein the first gate electrode includes a first slit overlappi…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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