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Gasification system employing ejectors
US9085472B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9085472-B2 |
| Application number | US-71430310-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 26, 2010 |
| Priority date | Feb 26, 2010 |
| Publication date | Jul 21, 2015 |
| Grant date | Jul 21, 2015 |
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Abstract
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In one embodiment, a black water processing system includes a vacuum pressure flash tank configured to separate gases from black water. The system also includes an ejector with a suction chamber and a nozzle. The suction chamber is coupled to the vacuum pressure flash tank, and the nozzle is configured to discharge a motive fluid across the suction chamber to create a vacuum within the vacuum pressure flash tank.
First claim
Opening claim text (preview).
The invention claimed is: 1. A black water processing system, comprising: a vacuum pressure flash tank configured to separate gases from black water; a high-pressure flash tank fluidly coupled to the vacuum pressure flash tank and disposed upstream of the vacuum pressure flash tank; and an ejector, comprising: a suction chamber comprising a first inlet and a second inlet; wherein the first inlet of the suction chamber is fluidly coupled to the vacuum pressure flash tank, an…
Assignees
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Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
- C02F1/20Primary
Chemistry & Metallurgy · mapped topic
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- What does patent US9085472B2 cover?
- In one embodiment, a black water processing system includes a vacuum pressure flash tank configured to separate gases from black water. The system also includes an ejector with a suction chamber and a nozzle. The suction chamber is coupled to the vacuum pressure flash tank, and the nozzle is configured to discharge a motive fluid across the suction chamber to create a vacuum within the vacuum p…
- Who is the assignee on this patent?
- Chinnadurai Uma, Gen Electric
- What technology area does this patent fall under?
- Primary CPC classification C02F1/20. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jul 21 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).