Method and system for monitoring deposition process
US-2024167814-A1 · May 23, 2024 · US
Dynamic peak tracking in X-ray photoelectron spectroscopy measurement tool
US9080948B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9080948-B2 |
| Application number | US-201313826316-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 14, 2013 |
| Priority date | Mar 14, 2013 |
| Publication date | Jul 14, 2015 |
| Grant date | Jul 14, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
Systems and methods for performing X-ray Photoelectron Spectroscopy (XPS) measurements in a semiconductor environment are disclosed. A reference element peak is selected and tracked as part of the measurement process. Peak shift of the reference element peak, in electron volts (eV) is tracked and applied to other portions of acquired spectrum to compensate for the shift, which results from surface charge fluctuation.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for performing measurements with an X-ray photoelectron spectroscopy measurement tool, comprising: irradiating a semiconductor substrate with X-ray energy; detecting emitted electrons from the semiconductor substrate; selecting a reference element peak based on the detected emitted electrons; recording an initial location for the reference element peak; computing a shift in location for the reference element peak; and applying a correction t…
Assignees
Inventors
Classifications
- G01N23/2273Primary
Physics · mapped topic
Physics · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9080948B2 cover?
- Systems and methods for performing X-ray Photoelectron Spectroscopy (XPS) measurements in a semiconductor environment are disclosed. A reference element peak is selected and tracked as part of the measurement process. Peak shift of the reference element peak, in electron volts (eV) is tracked and applied to other portions of acquired spectrum to compensate for the shift, which results from surf…
- Who is the assignee on this patent?
- IBM
- What technology area does this patent fall under?
- Primary CPC classification G01N23/2273. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jul 14 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).