Method of forming pattern and laminate

Patent metadata

Field	Value
Publication number	US-9073284-B2
Application number	US-201213626415-A
Country	US
Kind code	B2
Filing date	Sep 25, 2012
Priority date	Sep 26, 2011
Publication date	Jul 7, 2015
Grant date	Jul 7, 2015

Abstract

According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.

First claim

What is claimed is:

1. A laminate comprising:
a substrate;
a crosslinkable molecule layer absorbed on and attached to the substrate, the crosslinkable molecule layer comprising a crosslinkable molecule with a group that attaches to the substrate and a group that chemically bonds to another material, said group that attaches to the substrate being a silanol group, an alkoxy silyl group, a chlorosilyl group, a phosphonate group, a selenide group, a telluride group, a sulfide group, a disulfide group, a thiol group, an isocyanate group, a bromide group, a carbonyl group or a hydroxyl group and said group that chemically bonds to another material being an azide group; and
a photosensitive composition layer stacked and chemically bonded on the crosslinkable molecule layer, the photosensitive composition layer having a surface energy which is changed by irradiation with energy rays and crosslinking with the crosslinkable molecule thermally.

2. The laminate according to claim 1 , wherein a film thickness of the photosensitive composition layer is greater than 1 nm and smaller than 10 nm.

3. The laminate according to claim 1 , wherein the crosslinkable molecule is represented by formula (I):
z-X-Y  (I)

wherein
z represents a silanol group, an alkoxy silyl group, a chlorosilyl group, a phosphonate group, a selenide group, a telluride group, a sulfide group, a disulfide group, a thiol group, an isocyanate group, a bromide group, a carbonyl group or a hydroxyl group;
X represents an alkylene group or a combination group of an alkylene group and an ether linkage; and
Y represents an azido group or a benzenesulphonyl azido group.

4. The laminate according to claim 3 , wherein the crosslinkable molecule is represented by formula (Ib):

wherein
Me represents a methyl group; and
n represents an integer of 1 to 12.

5. The laminate according to claim 3 , wherein the crosslinkable molecule is represented by formula (IIb):

wherein
Me represents a methyl group; and
n represents an integer of 1 to 12.

6. The laminate according to claim 3 , wherein the crosslinkable molecule is represented by formula (IIIa):

wherein n represents an integer of 1 to 12.

7. The laminate according to claim 3 , wherein the crosslinkable molecule is represented by formula (IVa):

wherein n represents an integer of 1 to 12.

8. The laminate according to claim 3 , wherein the crosslinkable molecule is represented by formula (Va):

wherein n represents an integer of 1 to 12.

9. The laminate according to claim 3 , wherein the crosslinkable molecule is represented by Formula (VIa):

wherein n represents an integer of 1 to 12.

10. A laminate according to claim 1 , further comprising a block copolymer layer which is stacked on the photosensitive composition layer and comprises a block copolymer.

11. A laminate comprising:
a substrate;
a crosslinkable molecule layer stacked on and attached to the substrate, the crosslinkable molecule layer comprising a crosslinkable molecule with a group that attaches to the substrate and a group that chemically bonds to another material, said group that attaches to the substrate being a silanol group, an alkoxy silyl group, a chlorosilyl group, a phosphonate group, a selenide group, a telluride group, a sulfide group, a disulfide group, a thiol group, an isocyanate group, a bromide group, a carbonyl group or a hydroxyl group and said group that chemically bonds to another material being an azide group; and
a polymer layer which is stacked on the crosslinkable molecule layer and comprises a polymer not having photosensitivity.

12. The laminate according to claim 11 , further comprising a layer which is stacked on the polymer layer and comprises includes a resist and a block copolymer.

13. The laminate according to claim 11 , wherein the crosslinkable molecule is represented by formula (I):
z-X-Y  (I)

wherein
z represents a silanol group, an alkoxy silyl group, a chlorosilyl group, a phosphonate group, a selenide group, a telluride group, a sulfide group, a disulfide group, a thiol group, an isocyanate group, a bromide group, a carbonyl group or a hydroxyl group;
X represents an alkylene group or a combination group of an alkylene group and an ether linkage; and
Y represents an azido group or a benzenesulphonyl azido group.

14. The laminate according to claim 11 , wherein the crosslinkable molecule is represented by formula (Ib):

wherein
Me represents a methyl group; and
n represents an integer of 1 to 12.

15. The laminate according to claim 11 , wherein the crosslinkable molecule is represented by formula (IIb):

wherein
Me represents a methyl group; and
n represents an integer of 1 to 12.

16. The laminate according to claim 11 , wherein the crosslinkable molecule is represented by formula (IIIa):

wherein n represents an integer of 1 to 12.

17. The laminate according to claim 11 , wherein the crosslinkable molecule is represented by formula (IVa):

wherein n represents an integer of 1 to 12.

18. The laminate according to claim 11 , wherein the crosslinkable molecule is represented by formula (Va):

wherein n represents an integer of 1 to 12.

19. The laminate according to claim 11 , wherein the crosslinkable molecule is represented by formula (VIa):

wherein n represents an integer of 1 to 12.

Assignees

• Hieno Atsushi
• Hattori Shigeki
• Nakamura Hiroko
• Mikoshiba Satoshi
• Asakawa Koji
• Kanno Masahiro
• Seino Yuriko
• Azuma Tsukasa
• Toshiba Kk

Inventors

• Hieno Atsushi
• Hattori Shigeki
• Nakamura Hiroko
• Mikoshiba Satoshi
• Asakawa Koji
• Kanno Masahiro
• Seino Yuriko
• Azuma Tsukasa

Classifications

• G03F7/40 Primary

  Treatment after imagewise removal, e.g. baking · CPC title

• B32B7/04 Primary

  Interconnection of layers · CPC title

• G03F7/165

  Monolayers, e.g. Langmuir-Blodgett · CPC title

• G03F7/11

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• G03F7/004

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title