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High-frequency power supply device and reflected wave power control method
US9070537B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9070537-B2 |
| Application number | US-201314394341-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 3, 2013 |
| Priority date | Jun 18, 2012 |
| Publication date | Jun 30, 2015 |
| Grant date | Jun 30, 2015 |
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Abstract
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In an RF power supply for supplying RF power to a plasma load, reflected wave power control is performed in which the reflected wave power of an RF generator is detected and the RF generator is controlled. For a short-time variation in reflected wave power, control is performed based on a peak value variation in the detection value of reflected wave power. For a long-time variation in reflected wave power, control is performed based on a variation in a smoothed value obtained by smoothing detection values of reflected wave power. A reflected wave power control loop system includes a reflected wave power peak value dropping loop system and an arc blocking system that perform control based on a peak variation in reflected wave power and a reflected wave power amount dropping loop system that performs control based on a smoothed power amount of reflected wave power.
First claim
Opening claim text (preview).
The invention claimed is: 1. An RF power supplying device that supplies RF power to a plasma load, said RF power supplying device comprising: an RF generator unit that converts DC of a DC power supply to RF AC through a switching operation and outputs RF power; and a feedback system that feeds back a detection value of the RF output of said RF generator unit for performing feedback control, wherein said feedback system comprises: a forward wave power control loop system that…
Assignees
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Classifications
Electricity · mapped topic
Electricity · mapped topic
- H01J37/32174Primary
Electricity · mapped topic
Electricity · mapped topic
- H01J37/32183Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9070537B2 cover?
- In an RF power supply for supplying RF power to a plasma load, reflected wave power control is performed in which the reflected wave power of an RF generator is detected and the RF generator is controlled. For a short-time variation in reflected wave power, control is performed based on a peak value variation in the detection value of reflected wave power. For a long-time variation in reflected…
- Who is the assignee on this patent?
- Kyosan Electric Mfg
- What technology area does this patent fall under?
- Primary CPC classification H01J37/32174. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jun 30 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).