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US-9202697-B2 · Dec 1, 2015 · US
Method of manufacturing semiconductor device and semiconductor device having oxide film crystallized by a thermal treatment
US9064802B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9064802-B2 |
| Application number | US-11335008-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 1, 2008 |
| Priority date | Jun 8, 2007 |
| Publication date | Jun 23, 2015 |
| Grant date | Jun 23, 2015 |
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Abstract
Official abstract text for this publication.
A method of manufacturing a semiconductor device includes forming a metal oxide on a semiconductor substrate, forming a gate electrode film on the metal oxide, and executing a thermal treatment on the semiconductor substrate provided with the metal oxide and the gate electrode film to crystallize the metal oxide.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a semiconductor device, comprising: forming a first metal oxide on a substrate, the substrate including a semiconductor material; forming a gate electrode on the first metal oxide; and after the forming of the gate electrode on the first metal oxide, crystallizing the first metal oxide to a second metal oxide by a thermal treatment, wherein the gate electrode includes a first gate electrode layer and a second gate electrode la…
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Classifications
Electricity · mapped topic
Electricity · mapped topic
- H10D64/01338Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9064802B2 cover?
- A method of manufacturing a semiconductor device includes forming a metal oxide on a semiconductor substrate, forming a gate electrode film on the metal oxide, and executing a thermal treatment on the semiconductor substrate provided with the metal oxide and the gate electrode film to crystallize the metal oxide.
- Who is the assignee on this patent?
- Watanabe Yukimune, Seiko Epson Corp
- What technology area does this patent fall under?
- Primary CPC classification H10D64/01338. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jun 23 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).