Precursor wire for nb3al superconducting wire, nb3al superconducting wire, method for producing precursor wire for nb3al superconducting wire, and method for producing nb3al superconducting wire
US-2015348679-A1 · Dec 3, 2015 · US
US9064620B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9064620-B2 |
| Application number | US-201213814160-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 11, 2012 |
| Priority date | Jul 11, 2011 |
| Publication date | Jun 23, 2015 |
| Grant date | Jun 23, 2015 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Adhesiveness between a metallic substrate and a metal oxide layer is made to increase. A superconducting thin film ( 1 ) includes a metallic substrate ( 10 ), a metallic layer ( 22 ) that is formed on a main surface of the metallic substrate ( 10 ) and includes a metal element capable of being passivated as a main component, a metal oxide layer ( 24 ) that is formed on the metallic layer ( 22 ) and includes the passivated metal element as a main component, and a superconducting layer ( 40 ) that is formed on the metal oxide layer ( 24 ) directly or through an intermediate layer and includes an oxide superconductor as a main component.
Opening claim text (preview).
What is claimed is: 1. A superconducting thin film comprising: a metallic substrate, a metallic layer formed on a main surface of the metallic substrate, wherein the metallic layer comprises a metal element, a metal oxide layer formed on the metallic layer, wherein the metal oxide layer comprises the metal element in passivated form, and a superconducting layer formed on the metal oxide layer directly or through an intermediate layer, wherein the superconducting layer comprises an oxide superconductor. 2. The superconducting thin film according to claim 1 , wherein the metal oxide layer has a formula of A i O i (1<(j/i)≦3), wherein A is at least one selected from the group consisting of Al, Cr, and a rare-earth element. 3. The superconducting thin film according to claim 2 , further comprising: a composition gradient layer between the metallic layer and the metal oxide layer, wherein an oxide of the metal element and the metal element co-exist in the composition gradient layer, and a ratio of the oxide of the metal element with respect to the metal element in the composition gradient layer continuously increases in a lamination direction from the metallic layer to the metal oxide layer. 4. The superconducting thin film according to claim 3 , wherein at least the main surface of the metallic substrate comprises a Ni-based alloy or an Fe-based alloy. 5. The superconducting thin film according to claim 4 , wherein a thickness of the metal oxide layer is 10 nm to 300 nm. 6. The superconducting thin film according to claim 4 , wherein A comprises Al. 7. The superconducting thin film according to claim 4 , wherein A comprises Cr. 8. The superconducting thin film according to claim 3 , wherein at least the main surface of the metallic substrate comprises a Ni-based alloy. 9. The superconducting thin film according to claim 3 , wherein at least the main surface of the metallic substrate comprises an Fe-based alloy. 10. The superconducting thin film according to claim 1 , further comprising: a composition gradient layer between the metallic layer and the metal oxide layer, wherein an oxide of the metal element and the metal element co-exist in the composition gradient layer, and a ratio of the oxide of the metal element with respect to the metal element in the composition gradient layer continuously increases in a lamination direction from the metallic layer to the metal oxide layer. 11. The superconducting thin film according to claim 1 , wherein a thickness of the metal oxide layer is 10 nm or more. 12. The superconducting thin film according to claim 1 , wherein a thickness of the metal oxide layer is 300 nm or less. 13. The superconducting thin film according to claim 1 , wherein at least the main surface of the metallic substrate comprises a Ni-based alloy or an Fe-based alloy. 14. The superconducting thin film according to claim 1 , wherein a thickness of the metal oxide layer is 10 nm to 300 nm. 15. The superconducting thin film according to claim 1 , wherein at least the main surface of the metallic substrate comprises a Ni-based alloy. 16. The superconducting thin film according to claim 1 , wherein at least the main surface of the metallic substrate comprises an Fe-based alloy.
Electricity · mapped topic
Adjacent to each other · CPC title
characterised by their form · CPC title
having composition, density, or hardness gradient · CPC title
Electricity · mapped topic
Related publications grouped by family.
Answers are generated from the same data shown on this page.