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Photosensitive resin composition and photosensitive paste including the same
US9063418B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9063418-B2 |
| Application number | US-201414300996-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 10, 2014 |
| Priority date | Feb 27, 2012 |
| Publication date | Jun 23, 2015 |
| Grant date | Jun 23, 2015 |
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Abstract
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A photosensitive resin composition which is high in thermal decomposition property of a photocured product thereof even in a case of being subjected to heat treatment in a non-oxygen atmosphere and is less likely to generate a residue of carbon and a photosensitive paste composed of the same are provided. The composition contains (a) a photopolymerization initiator, (b) an acryl monomer, and (c) polyalkylene carbonate, in which a ratio of polyalkylene carbonate to a total amount of the acryl monomer and polyalkylene carbonate is not lower than 50 weight % and not higher than 90 weight %. Polypropylene carbonate is used as polyalkylene carbonate. The photosensitive paste is obtained by blending the photosensitive composition, a solvent, and inorganic powders. Insulating inorganic material powders or conductive metal powders are employed as the inorganic powders.
First claim
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The invention claimed is: 1. A photosensitive resin composition, comprising: (a) a photopolymerization initiator; (b) an acryl monomer; and (c) polypropylene carbonate, wherein an amount of said polypropylene carbonate is between 50 and 90 weight % of a total amount of said acryl monomer and said polypropylene carbonate. 2. A photosensitive paste, comprising: the photosensitive resin composition according to claim 1 ; a solvent; and inorganic powd…
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- What does patent US9063418B2 cover?
- A photosensitive resin composition which is high in thermal decomposition property of a photocured product thereof even in a case of being subjected to heat treatment in a non-oxygen atmosphere and is less likely to generate a residue of carbon and a photosensitive paste composed of the same are provided. The composition contains (a) a photopolymerization initiator, (b) an acryl monomer, and (c…
- Who is the assignee on this patent?
- Murata Manufacturing Co
- What technology area does this patent fall under?
- Primary CPC classification G03F7/038. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jun 23 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).