Bidirectional two-base bipolar junction transistor operation, circuits, and systems with diode-mode turn-on
US-9203400-B2 · Dec 1, 2015 · US
US9059232B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9059232-B2 |
| Application number | US-201314020260-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 6, 2013 |
| Priority date | Jun 13, 2013 |
| Publication date | Jun 16, 2015 |
| Grant date | Jun 16, 2015 |
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A base region extends upward from a recessed semiconductor surface of a semiconductor material portion present on an insulator. The base region includes a vertical stack of, an extrinsic base region and an intrinsic base region. The extrinsic base region includes a first compound semiconductor material portion of a first conductivity type and a first dopant concentration. The intrinsic base region includes another first compound semiconductor material portion of the first conductivity type and a second dopant concentration which is less than the first dopant concentration. A collector region including a second compound semiconductor material portion of a second conductivity type opposite of the first conductivity type is located on one side on the base region. An emitter region including another second compound semiconductor material portion of the second conductivity type is located on another side on the base region.
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What is claimed is: 1. A method of forming a semiconductor structure comprising: providing a structure including at least one semiconductor material portion laterally surrounded by an isolation structure and located on a surface of a buried insulator layer, wherein a layer of oxide is located on exposed surface of each of said at least one semiconductor material portion and said isolation structure; forming a trench through said layer of oxide and partially into said at least on…
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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