Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
Positive resist composition and method of pattern formation with the same
US9057952B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9057952-B2 |
| Application number | US-201213345978-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 9, 2012 |
| Priority date | Jul 26, 2005 |
| Publication date | Jun 16, 2015 |
| Grant date | Jun 16, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.
First claim
Opening claim text (preview).
What is claimed is: 1. A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid and which has no fluorine atom; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound having a molecular weight of 1,000 to 100,000 and containing (y) a group which decomposes by an action of an alkaline developing solution to enha…
Assignees
Inventors
Classifications
Physics · mapped topic
- G03F7/0397Primary
Physics · mapped topic
- G03F7/0046Primary
Physics · mapped topic
Physics · mapped topic
- G03F7/0045Primary
Physics · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US9057952B2 cover?
- A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern forma…
- Who is the assignee on this patent?
- Kanda Hiromi, Kanna Shinichi, Inabe Haruki, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0397. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jun 16 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).