Semiconductor device with laterally varying doping concentrations

US9054151B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9054151-B2
Application numberUS-201314053631-A
CountryUS
Kind codeB2
Filing dateOct 15, 2013
Priority dateJul 3, 2012
Publication dateJun 9, 2015
Grant dateJun 9, 2015

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Abstract

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A semiconductor device includes a semiconductor body including a first surface having a normal direction defining a vertical direction, a first n-type semiconductor region arranged below the first surface and having a first maximum doping concentration and a second n-type semiconductor region arranged below the first n-type semiconductor region and including, in a vertical cross-section, two spaced apart first n-type portions each adjoining the first n-type semiconductor region, having a maximum doping concentration which is higher than the first maximum doping concentration and having a first minimum distance to the first surface, and a second n-type portion adjoining the first n-type semiconductor region, having a maximum doping concentration which is higher than the first maximum doping concentration and a second minimum distance to the first surface which is larger than the first minimum distance. A p-type second semiconductor layer forms a pn-junction with the second n-type portion.

First claim

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What is claimed is: 1. A semiconductor device, comprising a semiconductor body comprising: a first surface having a normal direction defining a vertical direction; a first n-type semiconductor region arranged below the first surface and having a first maximum doping concentration; wherein the first n-type semiconductor region is devoid of p-type doping; a second n-type semiconductor region arranged completely within the first n-type semiconductor region and comprising, in a ve…

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What does patent US9054151B2 cover?
A semiconductor device includes a semiconductor body including a first surface having a normal direction defining a vertical direction, a first n-type semiconductor region arranged below the first surface and having a first maximum doping concentration and a second n-type semiconductor region arranged below the first n-type semiconductor region and including, in a vertical cross-section, two sp…
Who is the assignee on this patent?
Infineon Technologies Ag
What technology area does this patent fall under?
Primary CPC classification H10P34/40. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 09 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).