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US-9826153-B2 · Nov 21, 2017 · US
Mirror for the EUV wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
US9036772B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9036772-B2 |
| Application number | US-75645610-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 8, 2010 |
| Priority date | Apr 15, 2009 |
| Publication date | May 19, 2015 |
| Grant date | May 19, 2015 |
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Abstract
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A mirror for the EUV wavelength range ( 1 ) having a layer arrangement (P) applied on a substrate (S), the layer arrangement having a periodic sequence of individual layers, where the periodic sequence has at least two individual layers—forming a period—composed respectively of silicon (Si) and ruthenium (Ru). Also disclosed are a projection objective for microlithography ( 2 ) including such a mirror, and a projection exposure apparatus for microlithography having such a projection objective ( 2 ).
First claim
Opening claim text (preview).
The invention claimed is: 1. A mirror comprising: a layer arrangement applied on a substrate and configured for an extreme-ultraviolet wavelength range of light, said layer arrangement comprising: at least two periods of a periodic sequence, wherein each period of the periodic sequence consists of a silicon layer, a ruthenium layer, and at least one barrier layer composed of B 4 C having a thickness of greater than 0.35 nm and situated between the silicon layer and the ruthenium…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
- G02B17/0657Primary
Physics · mapped topic
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- What does patent US9036772B2 cover?
- A mirror for the EUV wavelength range ( 1 ) having a layer arrangement (P) applied on a substrate (S), the layer arrangement having a periodic sequence of individual layers, where the periodic sequence has at least two individual layers—forming a period—composed respectively of silicon (Si) and ruthenium (Ru). Also disclosed are a projection objective for microlithography ( 2 ) including such a…
- Who is the assignee on this patent?
- Dodoc Aurelian, Zeiss Carl Smt Gmbh
- What technology area does this patent fall under?
- Primary CPC classification G02B17/0657. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue May 19 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).