Field effect transistor devices with low source resistance

US9029945B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9029945-B2
Application numberUS-201113102510-A
CountryUS
Kind codeB2
Filing dateMay 6, 2011
Priority dateMay 6, 2011
Publication dateMay 12, 2015
Grant dateMay 12, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A semiconductor device includes a drift layer having a first conductivity type, a well region in the drift layer having a second conductivity type opposite the first conductivity type, and a source region in the well region. The source region has the first conductivity type and defines a channel region in the well region. The source region includes a lateral source region adjacent the channel region and a plurality of source contact regions extending away from the lateral source region opposite the channel region. A body contact region having the second conductivity type is between at least two of the plurality of source contact regions and is in contact with the well region. A source ohmic contact overlaps at least one of the source contact regions and the body contact region. A minimum dimension of a source contact area of the semiconductor device is defined by an area of overlap between the source ohmic contact and the at least one source contact region.

First claim

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What is claimed is: 1. A semiconductor device, comprising: a drift layer having a first conductivity type; a well region in the drift layer having a second conductivity type opposite the first conductivity type; a source region in the well region, the source region having the first conductivity type and defining a channel region in the well region, wherein the source region comprises a lateral source region adjacent the channel region and a plurality of source contact regions…

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What does patent US9029945B2 cover?
A semiconductor device includes a drift layer having a first conductivity type, a well region in the drift layer having a second conductivity type opposite the first conductivity type, and a source region in the well region. The source region has the first conductivity type and defines a channel region in the well region. The source region includes a lateral source region adjacent the channel r…
Who is the assignee on this patent?
Ryu Sei-Hyung, Capell Doyle Craig, Cheng Lin, and 5 more
What technology area does this patent fall under?
Primary CPC classification H10D30/66. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 12 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).