Method of water repellent treatment for pattern surface

Patent metadata

Field	Value
Publication number	US-9029074-B2
Application number	US-201414189018-A
Country	US
Kind code	B2
Filing date	Feb 25, 2014
Priority date	Mar 13, 2013
Publication date	May 12, 2015
Grant date	May 12, 2015

Abstract

Provided is a method of water repellent treatment for a pattern surface, the method including the steps of agitatingly mixing a perfluoropolyether-group-containing silane water repellent, an organic acid, a fluorine-containing solvent capable of dissolving the perfluoropolyether-group-containing silane water repellent and the organic acid, and water to hydrolyze the perfluoropolyether-group-containing silane water repellent, thereby obtaining a partial hydrolysate solution; forming a photosensitive resin layer on a substrate; applying the partial hydrolysate solution onto the photosensitive resin layer to form a water-repellent film; performing patterning exposure to the photosensitive resin layer and the water-repellent film; performing heat treatment to collectively cure an exposed portion of the photosensitive resin layer and the water-repellent film; and removing a non-exposed portion of the photosensitive resin layer and the water-repellent film by development treatment to form a pattern.

First claim

What is claimed is:

1. A method of water repellent treatment for a surface, the method comprising the steps of:
a) agitatingly mixing a perfluoropolyether-group-containing silane water repellent, an organic acid, a fluorine-containing solvent capable of dissolving the perfluoropolyether-group-containing silane water repellent and the organic acid, and water to hydrolyze the perfluoropolyether-group-containing silane water repellent, thereby obtaining a partial hydrolysate solution;
b) forming a photosensitive resin layer on a substrate;
c) applying the partial hydrolysate solution onto a surface of the photosensitive resin layer to form a water-repellent film;
d) performing patterning exposure to the photosensitive resin layer and the water-repellent film;
e) performing heat treatment to collectively cure an exposed portion of the photosensitive resin layer and the water-repellent film; and
f) removing a non-exposed portion of the photosensitive resin layer and the water-repellent film by development treatment to form a pattern.

2. The method according to claim 1 , wherein the perfluoropolyether-group-containing silane water repellent comprises at least one of compounds represented by formulae (1) to (4):
F-Rp-A-SiX a Y 3-a   (1)

in the formula (1), Rp represents a perfluoropolyether group, A represents an organic group having 1 to 12 carbon atoms, X represents a hydrolyzable group, Y represents a non-hydrolyzable group, and a represents an integer of 1 to 3;
Y 3-a X a Si-A-Rp-A-SiX a Y 3-a   (2)

in the formula (2), Rp, A, X, Y, and a have the same meanings as in the formula (1);

in the formula (3), Z represents a hydrogen atom or an alkyl group, Q 1 represents a divalent linking group, m represents an integer of 1 to 4, and Rp, A, X, Y, and a have the same meanings as in the formula (1); and
F-Rp-Q 2 A-SiX a Y 3-a ] n   (4)

in the formula (4), n represents 1 or 2, Q 2 represents a divalent linking group when n=1 and represents a trivalent linking group when n=2, and Rp, A, X, Y, and a have the same meanings as in the formula (1).

3. The method according to claim 1 , wherein a perfluoropolyether group moiety of the perfluoropolyether-group-containing silane water repellent has an average molecular weight of 500 or more and 10,000 or less.

4. The method according to claim 1 , wherein, in the step a), when the perfluoropolyether-group-containing silane water repellent, the organic acid, the fluorine-containing solvent, and the water are agitatingly mixed, a concentration of the perfluoropolyether-group-containing silane water repellent is 0.1 mass % or more and 20 mass % or less.

5. The method according to claim 1 , wherein, in the step a), when the perfluoropolyether-group-containing silane water repellent, the organic acid, the fluorine-containing solvent, and the water are agitatingly mixed, heat treatment is performed at 5° C. or more and 60° C. or less.

6. The method according to claim 1 , wherein, in the step a), when the perfluoropolyether-group-containing silane water repellent, the organic acid, the fluorine-containing solvent, and the water are agitatingly mixed, a mass of the organic acid is 0.001 or more times and 1 or less times a mass of the perfluoropolyether-group-containing silane water repellent.

7. The method according to claim 1 , wherein, in the step a), when the perfluoropolyether-group-containing silane water repellent, the organic acid, the fluorine-containing solvent, and the water are agitatingly mixed, an amount of the water is, on a stoichiometric basis, 0.1 equivalent or more and 5 equivalents or less with respect to 1 equivalent of a hydrolyzable group of the perfluoropolyether-group-containing silane water repellent.

8. The method according to claim 1 , wherein a solubility of the water in the fluorine-containing solvent is 100 ppm or less.

9. The method according to claim 1 , wherein, in the step c), the partial hydrolysate solution is applied onto the photosensitive resin layer after a concentration of the partial hydrolysate in the partial hydrolysate solution is adjusted to 0.01 mass % or more and 1.0 mass % or less.

10. The method according to claim 1 , further comprising performing heat treatment after the step c) and before the step d).

11. The method according to claim 1 , wherein the photosensitive resin layer includes a photocationically polymerizable resin containing an epoxy compound.

Assignees

• Canon Kk

Inventors

• Hamade Yohei
• Sawada Etsuko
• Ikegame Ken
• Mihara Hiroaki
• Tsutsui Satoshi

Classifications

• G03F7/11 Primary

  having cover layers or intermediate layers, e.g. subbing layers {(G03F7/091 - G03F7/093, B41N3/03 take precedence)} · CPC title

• G03F7/16 Primary

  Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title