Methods and compositions for restoring and maintaining hard surfaces
US-2024199984-A1 · Jun 20, 2024 · US
Surface treatment composition and surface treatment method using same
US9028709B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9028709-B2 |
| Application number | US-201113824778-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 23, 2011 |
| Priority date | Sep 27, 2010 |
| Publication date | May 12, 2015 |
| Grant date | May 12, 2015 |
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Abstract
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A surface treatment composition of the present invention contains a first surfactant, a second surfactant, a basic compound, and water. The surface treatment composition has a pH of 8 or more. The second surfactant has a weight-average molecular weight one-half or less that of the first surfactant. The sum of the content of the first surfactant and the content of the second surfactant is 0.00001 to 0.1% by mass.
First claim
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The invention claimed is: 1. A surface treatment composition comprising a first surfactant, a second surfactant, a basic compound, and water, the surface treatment composition having a pH of 8 or more, wherein the second surfactant has a weight-average molecular weight ½ times or less that of the first surfactant, and the sum of a content of the first surfactant and a content of the second surfactant is 0.00001 to 0.1% by mass, and wherein both the first surfactant and the secon…
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Electricity · mapped topic
Electricity · mapped topic
- C11D1/825Primary
Chemistry & Metallurgy · mapped topic
- C09K3/1463Primary
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
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- What does patent US9028709B2 cover?
- A surface treatment composition of the present invention contains a first surfactant, a second surfactant, a basic compound, and water. The surface treatment composition has a pH of 8 or more. The second surfactant has a weight-average molecular weight one-half or less that of the first surfactant. The sum of the content of the first surfactant and the content of the second surfactant is 0.0000…
- Who is the assignee on this patent?
- Tsuchiya Kohsuke, Morinaga Hitoshi, Yasufuku Noboru, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification C11D1/825. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue May 12 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).