Apparatus and method for monitoring glass plate polishing state

US9028294B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9028294-B2
Application numberUS-201113045273-A
CountryUS
Kind codeB2
Filing dateMar 10, 2011
Priority dateMar 11, 2010
Publication dateMay 12, 2015
Grant dateMay 12, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed are an apparatus and a method for monitoring a glass plate polishing state. The apparatus may include a location measuring unit for measuring a location on a glass plate being polished by a polishing machine, a current measuring unit for measuring an electric current flowing into the polishing machine, a memory unit for storing a reference value of the electric current flowing into the polishing machine for each polishing location of the glass plate, and a control unit for determining whether a polishing state is faulty, by comparing a value of the electric current measured by the current measuring unit for each polishing location measured by the location measuring unit with a corresponding reference value of the electric current stored in the memory unit for each polishing location.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for monitoring a glass plate polishing state, which monitors a polishing state during polishing of a glass plate using a polishing machine, the apparatus comprising: a location measuring unit for measuring multiple locations on the glass plate being polished by the polishing machine; a current measuring unit for measuring an electric current flowing into the polishing machine; a memory unit for storing reference values of the electric curren…

Assignees

Inventors

Classifications

  • Operations & Transport · mapped topic

  • B24B49/10Primary

    Operations & Transport · mapped topic

  • Operations & Transport · mapped topic

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Frequently asked questions

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What does patent US9028294B2 cover?
Disclosed are an apparatus and a method for monitoring a glass plate polishing state. The apparatus may include a location measuring unit for measuring a location on a glass plate being polished by a polishing machine, a current measuring unit for measuring an electric current flowing into the polishing machine, a memory unit for storing a reference value of the electric current flowing into th…
Who is the assignee on this patent?
Moon Won-Jae, Oh Hyung-Young, Lee Dae-Yeon, and 5 more
What technology area does this patent fall under?
Primary CPC classification B24B49/10. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 12 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).