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US-9202478-B1 · Dec 1, 2015 · US
Method of manufacturing a magnetoresistive device
US9023219B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9023219-B2 |
| Application number | US-201313826658-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 14, 2013 |
| Priority date | Apr 26, 2012 |
| Publication date | May 5, 2015 |
| Grant date | May 5, 2015 |
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Abstract
Official abstract text for this publication.
A method of manufacturing a magnetoresistive-based device includes a metal hard mask that is inert to a top electrode etch chemistry and that has low sputter yield during a magnetic stack sputter. The metal hard mask is patterned by the photo resist and the photo mask is then stripped and the top electrode (overlying magnetic materials of the magnetoresistive-based device) is patterned by the metal hard mask.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of manufacturing a magnetoresistive-based device, comprising: providing a magnetic material layer; depositing a first metal layer over the magnetic material layer; depositing a second metal layer over the first metal layer; providing a patterned photo resist over the second metal layer; etching the second metal layer not covered by the patterned photo resist to form a patterned metal hard mask; etching the first metal layer not covered by…
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Inventors
Classifications
Electricity · mapped topic
- G11B5/127Primary
Physics · mapped topic
- G11C11/161Primary
Physics · mapped topic
Cross-Sectional Technologies · mapped topic
Physics · mapped topic
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- What does patent US9023219B2 cover?
- A method of manufacturing a magnetoresistive-based device includes a metal hard mask that is inert to a top electrode etch chemistry and that has low sputter yield during a magnetic stack sputter. The metal hard mask is patterned by the photo resist and the photo mask is then stripped and the top electrode (overlying magnetic materials of the magnetoresistive-based device) is patterned by the m…
- Who is the assignee on this patent?
- Everspin Technologies Inc
- What technology area does this patent fall under?
- Primary CPC classification G11B5/127. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue May 05 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).