High aspect ratio dense pattern-programmable nanostructures utilizing metal assisted chemical etching
US-2015376798-A1 · Dec 31, 2015 · US
X-ray optical apparatus
US9020102B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9020102-B2 |
| Application number | US-201313778780-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 27, 2013 |
| Priority date | Mar 9, 2012 |
| Publication date | Apr 28, 2015 |
| Grant date | Apr 28, 2015 |
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Abstract
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The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized and emitted from the X-ray passage. When an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. Therefore, it is possible to efficiently parallelize the incident X-ray to be emitted with a simple structure.
First claim
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What is claimed is: 1. An X-ray optical apparatus, comprising: an X-ray reflective structure in which at least three reflective substrates are laminated so as to match both edges with an interval and an X-ray which is incident into an X-ray passage formed by a space, both sides of the passage being put between the reflective substrates, is reflected from the reflective substrate at both sides of the X-ray passage and emitted from the X-ray passage, wherein the at least three ref…
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- G21K1/06Primary
Physics · mapped topic
Physics · mapped topic
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- What does patent US9020102B2 cover?
- The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized a…
- Who is the assignee on this patent?
- Canon Kk
- What technology area does this patent fall under?
- Primary CPC classification G21K1/06. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).