Exposure apparatus, exposure method, and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9019472-B2
Application number	US-201313921502-A
Country	US
Kind code	B2
Filing date	Jun 19, 2013
Priority date	Aug 25, 2009
Publication date	Apr 28, 2015
Grant date	Apr 28, 2015

Abstract

An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage by irradiating a measurement beam using four heads installed on the wafer stage on a scale plate which covers the movement range of the wafer stage except for the area right under a projection optical system. Placement distances of the heads here are each set to be larger than width of the opening of the scale plates, respectively. This allows the positional information of the wafer stage to be measured, by switching and using the three heads facing the scale plate out of the four heads according to the position of the wafer stage.

First claim

What is claimed is:

1. An exposure apparatus which sequentially exposes an energy beam on a plurality of divided areas placed on an object, and forms a pattern on each of the plurality of divided areas, the apparatus comprising:
a movable body which holds the object and moves along a predetermined plane;
a position measurement system which has a plurality of heads provided on the movable body, and obtains positional information of the movable body based on measurement results of…

Assignees

• Nikon Corp

Inventors

• Shibazaki Yuichi

Classifications

• Y10T29/49004

  Cross-Sectional Technologies · mapped topic

• G03F9/70

  Physics · mapped topic

• G03F7/70975

  Physics · mapped topic

• G03F7/70725 Primary

  Physics · mapped topic

• G03F7/70775

  Physics · mapped topic