MEMS-based voltmeter

US9018937B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9018937-B2
Application numberUS-201213352219-A
CountryUS
Kind codeB2
Filing dateJan 17, 2012
Priority dateJan 17, 2012
Publication dateApr 28, 2015
Grant dateApr 28, 2015

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  5. First independent claim

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Abstract

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An electromechanical system (MEMS) voltmeter. An exemplary MEMS voltmeter includes a proof mass mounted to a substrate in a teeter-totter manner. The MEMS voltmeter also includes an input voltage plate located on the substrate under a first end of the proof mass. The first input voltage plate receives a voltage from a device under test. A drive voltage plate is located on the substrate under a second end of the proof mass. A first sense input voltage plate is located on the substrate under the first end of the proof mass. A second sense voltage plate is located on the substrate under the second end of the proof mass. A rebalancing circuit receives signals from the proof mass and the first and second sense voltage plates and generates a voltage value that is equal to the root mean square (RMS) voltage of the device under test.

First claim

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The embodiments of the invention in which an exclusive property or privilege is claimed are defined as follows: 1. A voltmeter comprising: a proof mass electrically coupled to an effective ground; an input voltage plate located on a substrate adjacent a first end of the proof mass, wherein the input voltage plate is configured to receive a voltage from a device under test; a drive voltage plate located on the substrate adjacent a second end of the proof mass; a sensing devic…

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What does patent US9018937B2 cover?
An electromechanical system (MEMS) voltmeter. An exemplary MEMS voltmeter includes a proof mass mounted to a substrate in a teeter-totter manner. The MEMS voltmeter also includes an input voltage plate located on the substrate under a first end of the proof mass. The first input voltage plate receives a voltage from a device under test. A drive voltage plate is located on the substrate under a …
Who is the assignee on this patent?
Werking Paul M, Honeywell Int Inc
What technology area does this patent fall under?
Primary CPC classification G01R5/00. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).