Sensor with field effect transistor having the gate dielectric consisting of a layer of lipids and method of fabricating this transistor

US9018740B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9018740-B2
Application numberUS-201214361026-A
CountryUS
Kind codeB2
Filing dateNov 30, 2012
Priority dateDec 6, 2011
Publication dateApr 28, 2015
Grant dateApr 28, 2015

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A field effect transistor ( 1 ) including: a semiconducting substrate ( 2 ) having two areas doped with electric charge carriers forming a source area ( 3 ) and a drain area ( 4 ), respectively; a dielectric layer positioned above the semiconducting substrate ( 2 ) between the source ( 3 ) and the drain ( 4 ) and forming the gate dielectric ( 9 ) of the field effect transistor ( 1 ); a gate ( 11 ) consisting of a reference electrode ( 8 ) and of a conductive solution ( 10 ), the solution ( 10 ) being in contact with the gate dielectric ( 9 ); and the gate dielectric ( 9 ) consists of a layer of lipids ( 13 ) in direct contact with the semiconducting layer ( 2 ). The invention also relates to a method for manufacturing such a field effect transistor ( 1 ) is disclosed.

First claim

Opening claim text (preview).

What is claimed is: 1. A field effect transistor including: a semiconducting substrate having two areas doped with electric charge carriers forming a source area and a drain area, respectively; a dielectric layer positioned above the semiconducting substrate between the source and the drain and forming the gate dielectric of the field effect transistor; a gate consisting of a reference electrode and of a conductive solution, the conductive solution being in contact with the ga…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9018740B2 cover?
A field effect transistor ( 1 ) including: a semiconducting substrate ( 2 ) having two areas doped with electric charge carriers forming a source area ( 3 ) and a drain area ( 4 ), respectively; a dielectric layer positioned above the semiconducting substrate ( 2 ) between the source ( 3 ) and the drain ( 4 ) and forming the gate dielectric ( 9 ) of the field effect transistor ( 1 ); a gate ( 1…
Who is the assignee on this patent?
Charrier Anne, Dallaporta Hervé, Nguyen Duc Tuyen, and 1 more
What technology area does this patent fall under?
Primary CPC classification G01N27/414. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).