Highly conformal extension doping in advanced multi-gate devices
US-9209274-B2 · Dec 8, 2015 · US
Electrically actuated device and method of controlling the formation of dopants therein
US9018083B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9018083-B2 |
| Application number | US-201414286513-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 23, 2014 |
| Priority date | May 4, 2011 |
| Publication date | Apr 28, 2015 |
| Grant date | Apr 28, 2015 |
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Abstract
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In an example of a method for controlling the formation of dopants in an electrically actuated device, a predetermined concentration of a dopant initiator is selected. The predetermined amount of the dopant is localized, via diffusion, at an interface between an electrode and an active region adjacent to the electrode. The dopant initiator reacts with a portion of the active region to form the dopants.
First claim
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What is claimed is: 1. A method for controlling the formation of dopants in an electrically actuated device, the method comprising: annealing a dopant initiator layer and an electrode positioned on the dopant initiator layer, thereby causing some dopant initiators in the dopant initiator layer to diffuse through the electrode to an exposed surface of the electrode; and after the annealing, depositing an active region on the diffused dopant initiators and the exposed surface of t…
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- What does patent US9018083B2 cover?
- In an example of a method for controlling the formation of dopants in an electrically actuated device, a predetermined concentration of a dopant initiator is selected. The predetermined amount of the dopant is localized, via diffusion, at an interface between an electrode and an active region adjacent to the electrode. The dopant initiator reacts with a portion of the active region to form the …
- Who is the assignee on this patent?
- Hewlett Packard Development Co
- What technology area does this patent fall under?
- Primary CPC classification H10P32/00. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).