Process for manufactuirng super-barrier rectifiers

US9018048B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9018048-B2
Application numberUS-201314032123-A
CountryUS
Kind codeB2
Filing dateSep 19, 2013
Priority dateSep 27, 2012
Publication dateApr 28, 2015
Grant dateApr 28, 2015

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A process for manufacturing a semiconductor device, wherein a semiconductor layer is formed on a body of semiconductor material; a first mask is formed on the semiconductor layer; a first conductive region is implanted in the body using the first mask; a second mask is formed laterally and complementarily to the first mask, at least in a projection in a plane parallel to the surface of the body; a second conductive region is implanted in the body using the second mask, in an adjacent and complementary position to the first conductive region; spacers are formed on the sides of the second mask region, to form a third mask aligned to the second mask; and, using the third mask, portions of the semiconductor layer are removed to form a gate region.

First claim

Opening claim text (preview).

The invention claimed is: 1. A process for manufacturing a semiconductor device, comprising: forming a semiconductor layer on a surface of a semiconductor body; forming a first mask on the semiconductor layer; forming a first conductive region in the body by introducing a first dopant species into the body using the first mask; forming a second mask laterally and complementarily to the first mask, at least in a projection in a plane parallel to the surface of the body; for…

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What does patent US9018048B2 cover?
A process for manufacturing a semiconductor device, wherein a semiconductor layer is formed on a body of semiconductor material; a first mask is formed on the semiconductor layer; a first conductive region is implanted in the body using the first mask; a second mask is formed laterally and complementarily to the first mask, at least in a projection in a plane parallel to the surface of the body…
Who is the assignee on this patent?
St Microelectronics Srl
What technology area does this patent fall under?
Primary CPC classification H10P30/22. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).