Method for providing a template for a self-assemblable polymer for use in device lithography
US-9182673-B2 · Nov 10, 2015 · US
Methods for manufacturing resin structure and micro-structure
US9017928B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9017928-B2 |
| Application number | US-201414154257-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 14, 2014 |
| Priority date | Feb 6, 2013 |
| Publication date | Apr 28, 2015 |
| Grant date | Apr 28, 2015 |
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Abstract
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A resin structure for the formation of a micro-structure is manufactured by (A) applying a composition comprising a polymer, a photoacid generator, an epoxy compound, and an organic solvent onto a substrate, (B) heating the composition to form a sacrificial film, (C) exposing imagewise the film to first high-energy radiation, (D) developing the film in an alkaline developer to form a sacrificial film pattern, (E) exposing the sacrificial film pattern to UV as second high-energy radiation, and (F) heating the substrate at 80-250° C. The exposure dose of first high-energy radiation in step (C) is up to 250 mJ/cm 2 . At the end of step (F), the sacrificial film has a sidewall angle of 80°-90° relative to the substrate.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method for manufacturing a resin structure for the formation of a micro-structure, comprising the steps of: (A) applying an optically patternable film-forming composition onto a substrate, said composition comprising (1) a polymer having some phenolic hydroxyl groups protected with an acid-labile protective group, (2) a photoacid generator, (3) an epoxy compound containing at least two epoxy groups and having a molecular weight of 200 to 3,000, and (…
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- G03F7/2024Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9017928B2 cover?
- A resin structure for the formation of a micro-structure is manufactured by (A) applying a composition comprising a polymer, a photoacid generator, an epoxy compound, and an organic solvent onto a substrate, (B) heating the composition to form a sacrificial film, (C) exposing imagewise the film to first high-energy radiation, (D) developing the film in an alkaline developer to form a sacrificia…
- Who is the assignee on this patent?
- Shinetsu Chemical Co
- What technology area does this patent fall under?
- Primary CPC classification G03F7/2024. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).