Resin, positive photosensitive resin composition and use
US-11886115-B1 · Jan 30, 2024 · US
Photoresist resin composition and method of forming patterns by using the same
US9017925B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9017925-B2 |
| Application number | US-201113224935-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 2, 2011 |
| Priority date | Mar 22, 2011 |
| Publication date | Apr 28, 2015 |
| Grant date | Apr 28, 2015 |
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Abstract
Official abstract text for this publication.
A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.
First claim
Opening claim text (preview).
What is claimed is: 1. A photosensitive resin composition, comprising: an alkali soluble base resin; a photoacid generator; a photoactive compound; and a phenol-based compound including a hydrophobic group, wherein the alkali soluble base resin is a tandem type resin and wherein the tandem type resin includes a mixture of a high molecular weight resin with a molecular weight of 5000 g/mol or more, a low molecular weight resin with a molecular weight of 500 g/mol or less, a…
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- G03F7/0226Primary
Physics · mapped topic
- G03F7/023Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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- What does patent US9017925B2 cover?
- A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive …
- Who is the assignee on this patent?
- Kim Jeong Won, Ju Jin Ho, Lee Jong Kwang, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0226. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).