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Film, method for manufacturing the film and masking method using the film
US9017920B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9017920-B2 |
| Application number | US-201213539617-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 2, 2012 |
| Priority date | Dec 22, 2011 |
| Publication date | Apr 28, 2015 |
| Grant date | Apr 28, 2015 |
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Abstract
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A film includes base and a photosensitive layer formed on the base. The photosensitive layer substantially includes a first photosensitive agent, a second photosensitive agent, and a thermosol. The first photosensitive agent is water-soluble. The second photosensitive agent is an aromatic ketone compound or a benzoin ether compound. The method for manufacturing the film and the masking method using the film is also provided.
First claim
Opening claim text (preview).
What is claimed is: 1. A film, comprising: a base; and a photosensitive layer formed on the base, the photosensitive layer substantially comprising a first photosensitive agent, a second photosensitive agent, and a thermosol, the first photosensitive agent being water-soluble, the second photosensitive agent being an aromatic ketone compound or benzoin ether compound, the mass percentage of the first photosensitive agent in the photosensitive layer being about 80% to about 90%.…
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- G03F7/0045Primary
Physics · mapped topic
Physics · mapped topic
Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
Cross-Sectional Technologies · mapped topic
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Frequently asked questions
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- What does patent US9017920B2 cover?
- A film includes base and a photosensitive layer formed on the base. The photosensitive layer substantially includes a first photosensitive agent, a second photosensitive agent, and a thermosol. The first photosensitive agent is water-soluble. The second photosensitive agent is an aromatic ketone compound or a benzoin ether compound. The method for manufacturing the film and the masking method u…
- Who is the assignee on this patent?
- Zhou Quan, Huang Chao-Sheng, Guan Xin-Wu, and 2 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/0045. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 28 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).